Nanotech 2014 Vol. 1
Nanotech 2014 Vol. 1
Nanotechnology 2014: Graphene, CNTs, Particles, Films & Composites

Nanoscale Materials Characterization Chapter 6

Converting Dimensions: A Facile and High-Yield Route for Getting Sub-100 nm Silicon Nanowires

Authors: S.H. Lee

Affilation: Yonsei University, Korea

Pages: 509 - 512

Keywords: silicon nanowire, metal-assisted chemical etching, sputtering, rapid thermal annealing

For synthesizing uniform sub-100-nm Si nanowires (NWs), we introduce a metal-assisted chemical etching (MCE)-based facile and high-yield route, employing simple thermal annealing and vacuum deposition processes. Under rapid thermal annealing, an ultrathin Ag film on a Si substrate is self-organized into Ag nanoparticles, which are used for making Si nanoholes through a short MCE process. After the sputter deposition of Ag on the caved Si substrate with nanoholes, a Ag nanomesh is obtained. Finally, with the nanomesh as an etching mask, Si NWs are successfully produced through a second MCE process.

ISBN: 978-1-4822-5826-4
Pages: 552
Hardcopy: $209.95

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