Nanotech 2012 Vol. 2
Nanotech 2012 Vol. 2
Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational (Volume 2)

NanoFab: Manufacturing & Instrumentation Chapter 7

Milling Process Control with Dimensional Feedback on a Focused Ion Beam - Scanning Electron Microscope System (FIB-SEM)

Authors: J.E. Sanabia

Affilation: Raith USA, Inc., United States

Pages: 463 - 465

Keywords: FIB, SEM, FIB-SEM, FIB/SEM, nanofabrication, metrology, milling, pattern, lithography

In nanofabrication and nanoanalysis, focused ion beam – scanning electron microscope (FIB-SEM) systems are increasingly used for demanding patterning tasks which rely on precise pattern placement and/or dimension control. Easily verifying and correcting for patterning accuracy during the FIB milling process in an automated fashion has previously not been possible. Here we present the use of a dedicated lithography platform on a commercially available FIB-SEM system for controlling the critical dimension during a FIB milling process. This has been achieved by controlling FIB-SEM system’s stage, the ion optics, and the electron optics through a single software interface.

ISBN: 978-1-4665-6275-2
Pages: 878
Hardcopy: $209.95

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