Authors: I. Utke, M.G. Jenke, C. Roeling, P.H. Thiesen, V. Iakovlev, A. Sirbu, A. Mereuta, A. Caliman, E. Kapon
Affilation: EMPA, Swiss Federal Laboratories for Materials Science and Technology, Switzerland
Pages: 224 - 225
Keywords: focused electron beam induced deposition, FEBID, VCSEL, polarization
The possibility to deposit or remove very small amounts of material for tuning purposes on a fully processed micro/nanodevice at the right place, at will, and without damage to surrounding sensitive areas can be very cost effective even if the speed of the deposition (or etching) is very low compared to standard photolithography. Here, we describe an emerging direct-write nanoscale patterning concept, based on gas-assisted focused electron beam induced deposition (FEBID), which enables local deposition of conductive material for refining the performance of a vertical-cavity surface-emitting laser (VCSEL) in a single post-process step.