Authors: R. Attota, R.M. Silver, A. Vladar
Affilation: NIST, United States
Pages: 172 - 175
Keywords: TSOM, nanoparticle, nanometrology, measurement, metrology
We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope, by analyzing through-focus scanning optical microscope (TSOM - pronounced as ‘tee-som’) images obtained at different focus positions. In principle, this technique can be used to identify which dimension is changing between two nanosized targets and to determine the dimension using a library-matching method. This methodology has potential utility for a wide range of target geometries and application areas, including nanomanufacturing, defect analysis, semiconductor process control, and biotechnology. In the current paper we present nanoparticle size and shape evaluation using the TSOM method.