Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

MEMS Fab: Design, Manufacture, Instrumentation Chapter 5

Influence of resist composition on demolding force in UV nanoimprint lithography

Authors: A. Amirsadeghi, J. Lee, S. Park

Affilation: Louisiana State University, United States

Pages: 272 - 275

Keywords: nano imprint lithography, UV, demolding force, Young’s modulus

Abstract:
We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.


ISBN: 978-1-4398-3402-2
Pages: 862
Hardcopy: $189.95