Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

Electronics & Photonics Chapter 1

Comprehensive Examination of Intrinsic-Parameter-Induced Characteristic Fluctuations in 16-nm-Gate CMOS Devices

Authors: M-H Han, Y. Li

Affilation: National Chiao Tung University, Taiwan

Pages: 21 - 24

Keywords: intrinsic parameter fluctuation, nanoscale MOSFET, emerging device technology, modeling, simulation

In this work, the intrinsic device parameter variability including the metal gate workfunction fluctuation (WKF), the process variation effect (PVE), and the random dopant fluctuation (RDF) in 16-nm-gate n-type MOSFETs (NMOS) and p-type MOSFETs (PMOS) are comprehensively studied. The results of this study show that RDF dominates the NMOS device characteristics, and WKF is major factor in PMOS. PVE affect the CMOS device AC characteristics, especially at high gate bias.

ISBN: 978-1-4398-3402-2
Pages: 862
Hardcopy: $189.95

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