Authors: S. Choi and M. Daugherty
Affilation: Enable IPC Corporation, United States
Pages: 514 - 515
Keywords: nanowire, silicon, alumina, nanopore, template, CMOS
We have developed a CMOS-compatible process for manufacturing nanowires directly on silicon (or other) substrates. This process removes some of the steps for conventional nanowire manufacture. The result are highly-ordered, high aspect-ratio nanowires for use in a variety of applications (we are concentrating on cathodes for rechargeable lithium ion batteries).
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