Authors: J. Haaheim
Affilation: NanoInk, Inc., United States
Pages: 243 - 246
Keywords: dip pen nanolithography, DPN, nanofabrication, nanostructures, nanoassembly, nanobio, templating, MEMS, scanning probe lithography, SPL
Precision nanoscale deposition is a fundamental requirement for much of current nanoscience research. Further, depositing a wide range of materials as nanoscale features onto diverse surfaces is a challenging requirement for nanoscale processing systems. Dip Pen NanolithographyTM (DPN®) is a high resolution scanning probe-based direct-write technology emerging as a promising solution for these requirements. It is fundamentally a bottom up nanoscale deposition technique (i.e. templated assembly); however, direct-write with etch resist “inks” leads to a powerful form of top down nanofabrication. Using etch-resist techniques and large area nanoscale patterning, DPN can create solid state or metal nanostructures across an entire centimeter chip. In terms of bottom up assembly, DPN can tailor chemical composition and surface structure on the sub-100 nm scale for site-specific biomolecule placement, nanoscale biological recognition, catalysis, and nanoelectronic connectivity. NanoInk’s platform system, the NScriptor™, is an instrument and software package enabling nanoscale registry and alignment, sophisticated CAD design, and high quality AFM imaging. To support this, NanoInk has developed chemical ink libraries, MEMS pen systems for serial and massively parallel printing, and selective ink delivery systems.
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