Nanotech 2006 Vol. 3
Nanotech 2006 Vol. 3
Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 3

Nanoscale Fabrication Chapter 2

Nanogaps for fabrication of Molecular Devices

Authors: M.S. Kabir and P. Enokson

Affilation: Chalmers University of Technology, Sweden

Pages: 225 - 228

Keywords: electron beam lithography, EBL, e-beam evaporation, atomic force microscopy, AFM, scanning electron microscopy, SEM, self assembling

The development of different alternative technologies to fabricate various types of nanoscale devices based on non-conventional materials such as molecules and clusters are here reported. We had two different approaches to fabricate nangaps though there are different ways of accomplishing this target, namely, (a) two angle evaporation and (b) shot modulation. We have explored the shot modulation technique to define the nanogap dimensions using electron beam lithography which was found to be more advantageous over the two angle evaporation technique. <br>&nbsp;<br>Utilizing these nanogaps fabricated on oxidized aluminium gate, we have exploited the quasi one-dimensional nature of these materials in combination with e.g. self assembling techniques, surface treatments and nanolithography for device functionality. <br>&nbsp;<br>We have investigated the electronic properties of gold clusters either capped (bounded by organic legends) or stabilized with some specific organic molecules with the aim of fabricating novel electronic devices that will be here reported. However an important observation from all these experiments and analysis is that: “the characteristics of an electronic ‘nano-device’ strongly correlates with the method of device fabrication”. The developed technology with shot modulation technique will allow to further investigating nanoscale electronic elements.

ISBN: 0-9767985-8-1
Pages: 913
Hardcopy: $119.95

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