Nanotech 2005 Vol. 3
Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3

MEMS/NEMS Design and Applications Chapter 8

Computer-Based Process Design Support for MEMS

Authors: A. Wagener, J. Popp, T. Schmidt and K. Hahn

Affilation: University of Siegen, Germany

Pages: 509 - 512

Keywords: process tools, process design, TCAD, methodology, MEMS

A process management and development system for MEMS design is introduced. It allows the specification of processes for specific applications and the tracking of the development procedures. Unlike in microelectronics the process configuration for MEMS is strongly coupled to the intended application. Process engineers on the one side and designers defining the structure on the other side are therefore target user for the system. Configured process flow can be checked with regard to internal consistency. Means to convert the process sequence to a 3-dim layer structure and vice versa are provided as well as assessment tools to compare process variations. The system is based on a dedicated database environment that is able to store and manage all process related design constraints and development related data linked to the fabrication process data itself. The interdependencies between application specific processes and all stages of the design flow will be discussed and a software system will be introduced meeting the requirements of this new approach.

ISBN: 0-9767985-2-2
Pages: 786
Hardcopy: $109.95

2015 & Newer Proceedings

Nanotech Conference Proceedings are now published in the TechConnect Briefs

NSTI Online Community