Nanotech 2005 Vol. 3
Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3

Nanoscale Device and Process Modeling Chapter 1

Low Field Electron Mobility in Ultra-Thin Strained-Si Directly on Insulator MOSFET in Sub-0.1µm Regime

Authors: S. Amtablian and S. Barraud

Affilation: CEA-DRT/LETI, France

Pages: 37 - 40

Keywords: FD-SOI, strained-SOI, effective mobility, quantum effect

 A 200 word (or less) text only summThe fabrication of Fully-Depleted strained-Si directly on insulator (SSOI) MOSFET was recently demonstrated. The combination of strain-induced transport property with the scaling advantage of ultra-thin body devices is a promising way to aggressively scaled device. The motivation of this work is to developed a new low field mobility model well suited to SOI and SSOI nMOSFET with a film thickness TSOI varying from 20nm to 5nm. For the first time, a methodology based on an improved split C-V method is used to extend the effective mobility calculation in sub-0.1µm regime taking into account corrections of S-D series resistance RSD and parasitic capacitance Cp both in SOI and SSOI nMOSFET

ISBN: 0-9767985-2-2
Pages: 786
Hardcopy: $109.95

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