Authors: A.W. Cooper, P.T. Docker and M.C. Ward
Affilation: The University of Birmingham, United Kingdom
Pages: 508 - 510
Keywords: DRIE, gratings, SOI, dry release
This paper describes a novel technique for manufacturing optical gratings by using the one step DRIE (Deep Reactive Ion Etching) process. Using the notching effect documented in previous work when working with silicon on insulator (SOI) wafers, fully released intact gratings have now been produced.