Authors: W.M. Wood and J.E. Nichols
Affilation: Kuhara Corporation, United States
Pages: 330 - 333
Keywords: optical thin film, color analog archiving, focused ion beam, digital archiving, diffractive structure
We have demonstrated the use of selective, reproducible, milling of sub-micron feature sizes by focused ion beam of optical thin film structures made from robust materials for color and B&W, analog and digital image and text archiving. This method has also been used to create diffractive structures with controlled, variable diffraction efficiencies. Modeling of the material optical properties, both pre- and post- milling, has enabled accurate prediction of material reflective, transmissive, and diffractive properties, and has effectively shown that ion implantation effects, such as compositional changes and ion deposition, are of second order importance to the optical behaviour of the thin film system.
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