Nanotech 2004 Vol. 2
Nanotech 2004 Vol. 2
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 2

MEMS Modeling Chapter 6

Using Topology Derived Masks to Facilitate 3D Design

Authors: R. Schiek and R. Schmidt

Affilation: Sandia National Laboratories, United States

Pages: 291 - 294

Keywords: topology, mask, MEMS, design, optimization

To accelerate MEMS design for surface micromachining applications, an algorithm and associated design tool have been created which translates designers’ 3D models into 2D lithographic production masks. Typically, designing a surface micromachined, MEMS device requires the creation of a two-dimensional mask set describing how layers of material are used to construct the three-dimensional object. Mask sets are specific to a fixed production process and are effectively the tooling required to manufacture a device. This design tool was developed and implemented such that when given a three-dimensional object it can infer from the object’s topology the two-dimensional masks needed to produce that object with surface micromachining. The masks produced by this design tool can be generic, process independent masks or, if given process constraints, specific for a target process allowing 3D designs to be carried across multiple processes.

ISBN: 0-9728422-8-4
Pages: 519
Hardcopy: $79.95

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