Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 1
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1

Micro and Nano Structuring and Assembly Chapter 10

Ferrofluid Masking for Lithographic Applications

Authors: B. Yellen and G. Friedman

Affilation: Drexel University, United States

Pages: 451 - 454

Keywords: ferrofluid, self-assembly, self-aligning, masking

Abstract:
A novel self-aligned “soft masking” method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.


ISBN: 0-9728422-7-6
Pages: 521
Hardcopy: $79.95