Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 2
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 2

Compact Modeling Chapter 7

A Technology-based Compact Model for Predictive Deep-Submicron MOSFET Modeling and Characterization

Authors: X. Zhou, S.B. Chiah and K.Y. Lim

Affilation: Nanyang Technological University, Singapore

Pages: 266 - 269

Keywords: compact model, deep-submicron MOSFETs, scalability, symmetry, technology development

This paper presents new development results of our compact model (Xsim) for deep-submicron MOSFETs. Although a threshold-voltage-based and source-referenced regional model, Xsim meets the basic requirements of continuity (to third-order derivatives), scalability (entire geometry range), and symmetry, with a single-piece unified equation that approaches the ideal long-side-channel expression. Model calibration requires minimum measurement data with one-iteration parameter extraction, which can be extrapolated to predicting characteristics of extremely-scaled devices with severe threshold voltage roll-off, a regime in which most common models do not (or cannot) model.

ISBN: 0-9728422-1-7
Pages: 600

2015 & Newer Proceedings

Nanotech Conference Proceedings are now published in the TechConnect Briefs

NSTI Online Community