Li G., Hubbard T., Antonsson E.K.
Daltech-Dalhousie University, CA
Keywords: etching., MEMS, micromachines, silicon, simulations
This paper presents an interactive on-line wet etch simulator (SEGS) which predicts the etched shape as a function of time for arbitrary isotropic or anisotropic etchants and any initial mask shape. Using any Javaenabled web browser users can draw initial masks, choose the etchant, simulate the etching, and view animation results. SEGS can be accessed athttp://mira.me.tuns.ca/
Journal: TechConnect Briefs
Volume: Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems
Published: April 6, 1998
Pages: 356 - 361
Industry sector: Sensors, MEMS, Electronics
Topic: Modeling & Simulation of Microsystems
ISBN: 0-96661-35-0-3