Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 9

Modeling of Deposition Process by Level Set Method
H. Jung, O. Kwon, S. Yoon and T. Won
Inha University, KR

Layout Verification and Correction of CMOS-MEMS Layouts
B. Baidya, K. He and T. Mukherjee
Carnegie Mellon, US

Diffusion Induced Stresses in Microstructures of MEMS
F. Yang
University of Rochester, US

Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction
N. Chaâbane, H. Vach and G.H. Peslherbe
CNRS-Ecole Polytechnique, FR

A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator
C-Y. Lee and E.K. Antonsson
California Institute of Technology, US

Bonding Pad Resistance. A Combined Approach
G. Bouche, R. Gonella and E. Sabouret
Technology Modeling STMicroelectronics, FR

Time Series Modelling of Surface Topography Generated by Ultrasonic Machining Process
V.S.R. Murti, B. Naga Prasada Rao and M. Krishna Reddy
Osmania University, IN

ISBN: 0-9708275-0-4
Pages: 638