NSTI Nanotech 2009

Pulsed Laser Deposition of CaxBa1-xNb2O6 Thin Film on Nano-patterned Silicon Substrate

I. Stateikina, S. Delprat, M. Chaker
Institut National de la Recherche Scientifique, CA

Keywords: silicon nano-pattern, CBN, pulsed laser deposition, thin film


In brief summary, this work presents pulsed laser deposition of CaxBa1-xNb2O6 thin film on nano-patterned silicon substrate. In addition, the nano-patterning method uses advantages of: • E-Beam Lithography, i.e. its flexibility in pattern writing limited only by E-Beam resolution, for changes in lateral dimensions, and • wet chemical anisotropic etching, such as ease of modeling and predictable shape and depth of chosen features, to “fine-tune” the period and shape of the profiles on silicon substrate for optimal growth of optoelectronic film with predetermined crystal structure.
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