2008 NSTI Nanotechnology Conference and Trade Show - Nanotech 2008 - 11th Annual

Partnering Events:

TechConnect Summit
Clean Technology 2008

New Approach for Successful HF Vapour Etching for MEMS release applications

A. Atherton, T. O’Hara, G. Pringle, M. Leavy
Senior Technologist, US

anhydrous, HF, release etch, sacrificial oxide

Novel new methods for the controlled vapor etching of dielectric films using anhydrous HF.

Nanotech 2008 Conference Program Abstract