2008 NSTI Nanotechnology Conference and Trade Show - Nanotech 2008 - 11th Annual

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TechConnect Summit
Clean Technology 2008

Pre-Distortion Assessment of Workfunction Engineered Multilayer Dielectric Design of DMG ISE SON MOSFET

R. Kaur, R. Chaujar, M. Saxena, R.S. Gupta
Semiconductor Devices Research Laboratory, IN

DM, ISE, SON, intermodulation

To overcome miniaturization roadblock, innovative architectural enhancements involving the use of an improved SOI like architecture called Silicon On Nothing (SON) capable of SCE and DIBL suppression onto the existing ISE devices [2], has been considered for SCEs suppression. Further to overcome the electron transport inefficiency, Dual Material Gate (DMG) architecture has also been integrated thereby presenting ultimate device architecture of DMG ISE SON MOSFET for ULSI era. In this work, linearity performance of 50nm DMG ISE SON MOSFET has been investigated and compared with other Single/ Dual Material Gate (S/DMG) taking into consideration the non-equilibrium transport effect implemented via Energy Balance Transport (EBT) model activated through ATLAS-2D device simulation software. The work discusses the linearity Figure of Merits -VIP2, VIP3 and third order intermodulation distortion IMD3 and thereby, provides optimal bias point selection

Nanotech 2008 Conference Program Abstract