2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication

B.C. Lee, M.H. Kim, H.J. Shin and S. Moon
Korea Institute of Science and Technology, KR

nanowire, NEMS, nanoscale etch, MPOM, MPOL, electroless plating, selective etching

In this works, we developed a novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), to realize proposed fabrication of metal nanowires. Using this method, we simply and uniformly self-controlled etching rate of about 30nm/times through whole wafer level and we proposed a novel top-down fabrication process, the metal peel-off lithograph(MPOL), to pattern and form metal nanowires.

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Nanotech 2007 Conference Program Abstract


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