2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Analysis of Halo Implanted MOSFETs.

C.C. McAndrew and P.G. Drennan
Freescale Semiconductor, US

MOSFET model, halo implant, analytic model

MOSFETs with heavily doped regions at one or both ends of the channel exhibit some quantitative differences in electrical behavior compared to devices with laterally unform channel doping. These can include a peakiness to the transconductance near threshold, asymmetries in capacitance, and a surprising decrease in the statistical variation of the peak gain factor as channel length decreases. Historically accurate modeling of such devices is best done with sectional MOSFET models. Here we present an analytic model of the behavior of the current and transconductance of a (unilaterally or bilaterally) halo implanted MOSFET and show that it predicts the decrease in variation of gain factor with channel length.

Back to Program

Sessions Sunday Monday Tuesday Wednesday Thursday Authors Keywords

Nanotech 2007 Conference Program Abstract


Names, and logos of other organizations are the property of those organizations and not of NSTI.
This event is not open to the general public and NSTI reserves the right to refuse admission and participation to any individual.