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Fabrication technique for nanochannel with directed buckle patterning

S. Chung, M-W Moon, K.H. Oh, D.C. Han, R.D. Kamm and J.W. Hutchinson
Massachusetts Institute of Technology, US

nanochannel, delamination buckling, nanofluidics

New method to fabricate nanochannels with directed buckling patterns of laminated films is presented. Generally, buckling delamination caused by compressive stress in thin rigid film on rigid substrate is considered as a drawback should be avoided during further application of thin film with good mechanical performance like hard coatings, semiconductor chip align, or bioapplication. However we have confined the growth of delaminated buckling to desired direction and controlled opening area, defined by delaminated height by changing directed width of channel. Various 2-dimensional patterns can be made. With buckling nanochennal, we integrated additional flow lines with simple photolithography process to connect buckling nanochannel with outer fluidic interfaces. We have done flow experiment in buckling nanochannels, and generated two phase flow with Y-shaped channels for nanochannel mixing. The method in this work can make it very simple to fabricate nanochannels, without access hole, bonding protocols, residues and particles. Cross-sectional area or channel height can be controlled with width of lines and thickness of deposited structure film from several hundreds of namometers. Not only silicon and glass, various materials such as metal, plastics, DLC, and so on can be used if they have different inner stress than that of substrate

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