Nano Science and Technology Institute
Nanotech 2012 Vol. 2
Nanotech 2012 Vol. 2
Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational (Volume 2)
 
Chapter 6: Micro & Nano Reliability
 

Modeling of Dynamic Threshold Voltage of High K Gate Stack and Application in FinFET Reliability

Authors:H. He, C. Ma, C. Wang, A. Zhang, J. He
Affilation:Peking Univeristy, CN
Pages:428 - 431
Keywords:dynamic threshold voltage, nanoscale device, FinFET, reliaiblity modeling, circuit performance simulation
Abstract:A modeling study of dynamic threshold voltage in high K gate stack is reported in this paper. Both slow transient (STCE) and fast transient charging effect (FTCE) are included in this model. Finally, this model is applied in FinFET reliability and circuit performances are simulated. The result shows that, the drain circuit (Id) degradation in FinFET is much more obvious than normal MOSFETs with the same processes and the variation of Id is slower in higher temperature. However, the dynamic threshold voltage in high K stack seems not affect the delay time of reverser simulated by HSPICE.
ISBN:978-1-4665-6275-2
Pages:878
Hardcopy:$209.95
 
Order:Mail/Fax Form
Up
© 2014 Nano Science and Technology Institute. All Rights Reserved.
Terms of Use | Privacy Policy | Contact Us | Site Map