Nano Science and Technology Institute
Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

Chapter 5:

MEMS Fab: Design, Manufacture, Instrumentation

-Influence of resist composition on demolding force in UV nanoimprint lithography
 A. Amirsadeghi, J. Lee, S. Park
 Louisiana State University, US
-Maskless Lithography Using Patterned Amorphous Silicon Layer Induced by Femtosecond Laser Irradiation
 A. Kiani, K. Venkatakrishnan, B. Tan
 Ryerson University, CA
-Micro Crumples for Self-Assembly of Field Emission Devices
 S. Sambandan
 Palo Alto Research Center, US
-Monolithic CMOS MEMS technology development: A piezoresistive-sensors case study
 A. Chaehoi, D. Weiland, D. O’Connell, S. Bruckshaw, S. Ray, M. Begbie
 Institute for System Level Integration, UK
-Practical issues with ion beam milling in acoustic resonator technologies
 S. Mishin, Y. Oshmyansky, F. Bi
 Advanced Modular Systems, Inc, US
-Investigation on correlation between cold/hot weld line mechanical properties and micro injection molding processing parameters
 L. Xie, D. Zhu, G. Ziegmann, L. Steuernagel
 Technology University of Clausthal, DE
-Machining Using Fast Tool Servo Combined with Ultrasonic Vibrator
 S.C. Choi, Lu Hong, D.W. Lee
 Pusan University, KR
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