Authors: B.C. Lee, M.H. Kim, H.J. Shin and S. Moon
Affilation: Korea Institute of Science and Technology, Korea
Pages: 279 - 282
Keywords: nanowire, NEMS, nanoscale etch, MPOM, MPOL, electroless plating, selective etching
In this works, we developed a novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), to realize proposed fabrication of metal nanowires. Using this method, we simply and uniformly self-controlled etching rate of about 30nm/times through whole wafer level and we proposed a novel top-down fabrication process, the metal peel-off lithograph(MPOL), to pattern and form metal nanowires.