Nano Science and Technology Institute - NSTI  
Nano Science and Technology Institute   Home | Subscribe | Site Map  
  ABOUT | COURSES | EVENTS | PUBLICATIONS | LEADERSHIP | OUTREACH | NEWS | PRESS | JOBS | Nanotechnology Solutions
px
px fade_top
Publications
Nanotech 2008 CDROM
Nanotech 2007 CDROM
Nanotech 2006 CDROM
Nanotech 2005 CDROM
Nanotech 2004 CDROM
3 CDROM Special Offer
Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 2
Nanotech 2008 Vol. 3
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 2
Nanotech 2007 Vol. 3
Nanotech 2007 Vol. 4
Nanotech 2006 Vol. 1
Nanotech 2006 Vol. 2
Nanotech 2006 Vol. 3
Nanotech 2005 Vol. 1
Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 3
WCM 2005
Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 2
Nanotech 2004 Vol. 3
Nanotech 2003 Vol. 1
Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 3
Nanotech 2002 Vol. 1
Nanotech 2002 Vol. 2
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 2
MSM 2000
MSM 99
MSM 98
Index of Authors
Index of Keywords
Index of Affiliations
Library Request Form
Shopping Cart
Order Form
 
Publications Publications
Nanotech 2006 Vol. 3
p
 
Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 3
Nanotech 2006 Vol. 3
Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 3
 
Chapter 7: Compact Modeling
 

An Explicit Quasi-Static Charge-Based Compact Model for Symmetric DG MOSFET

Authors:F. Prégaldiny, F. Krummenacher, J.-M. Sallese, B. Diagne and C. Lallement
Affilation:InESS, FR
Pages:686 - 691
Keywords:double-gate MOSFET, transcapacitance, EKV, compact modeling
Abstract:This paper presents a closed-form compact model for the undoped double-gate (DG) MOSFET under symmetrical operation. This charge-based model aims at giving a comprehensive understanding of the device from the circuit design point of view. Both static and dynamic models are derived in terms of simple analytic relationships based on our new explicit formulation of the mobile charge density. Our approach is derived from physics and relies on the EKV formalism originally developed for bulk MOSFETs. The model takes into account the mobility degradation and the DIBL (Drain-Induced Barrier Lowering) and is valid for devices with channel length down to 100 nm. Comparisons with 2D numerical simulations give evidence for the accuracy of the model. Furthermore, the VHDL-AMS code of the presented model leads to fast simulations, thus demonstrating that the model is well-suited for circuit simulation.
An Explicit Quasi-Static Charge-Based Compact Model for Symmetric DG MOSFETView paper
ISBN:0-9767985-8-1
Pages:913
Hardcopy:$185.00
 
Order:Mail/Fax Form
Special:3 CD Set — 15% off with Free Shipping
Up
Upcoming Events
Nanotech 2009
Cleantech 2009
BioNano 2009
TechConnect Summit
nanoPRwire™
nanoPRwire
News Headlines
nano World news
 
 
 
 
px
© Nano Science and Technology Institute     About NSTI | Terms of Use | Privacy Policy | Contact