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 | Nanotech 2006 Vol. 3
Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 3
Chapter 2: Nanoscale Fabrication |
| | Interpretation of Anomalous Photoluminescence Peak in GaAs1-xNx Grown by Molecular Beam Epitaxy | | Authors: | W.J. Fan, W.K. Cheah, S.F. Yoon, D.H. Zhang, R. Liu and A.T.S. Wee | | Affilation: | Nanyang Technological University, SG | | Pages: | 186 - 189 | | Keywords: | GaAsN, MBE, PL, SIMS | | Abstract: | Low-temperature (10K) photoluminescence (PL) measurements of GaAs1-xNx epitaxial layers grown on GaAs by solid-source molecular beam epitaxy (SSMBE) reveal an anomalous second peak. Rapid thermal annealing (RTA) of a specific GaAsN sample reveals a lower energy peak (γ) which redshifts and a higher energy peak (α) which blueshifts when increasing annealing temperature. The band anticrossing model is used to identify the origins of the two peaks and we propose a model to explain the RTA observations by the concept of increased confinement in areas of higher N concentrations by trapped N localized states. The γ peak is due to the accumulation of N content near the GaAs/GaAsN interface. | | ISBN: | 0-9767985-8-1 |
| Pages: | 913 |
| Hardcopy: | $185.00 |
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