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 | Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3
Chapter 4: Nano Scale Electronics Processing |
| | A Highly Reliable Pattern Transfer of Hydrogen Silsequioxane | | Authors: | J.F. Liu, S.Z. Chen, H.J.H. Chen and F.S. Huang | | Affilation: | National Tsing Hua University, TW | | Pages: | 279 - 282 | | Keywords: | nanoimprint lithography, hydrogen silsequioxane, room temperature aging effect | | Abstract: | In this paper, we focus on the effects of process parameters on pattern embossing into HSQ films, and the pattern degradation of HSQ for room temperature aging effects. The dilution of HSQ affects not only the film thickness but also pattern transfer. Fidelity pattern replication between mold and HSQ film is due to the plastic deformation of HSQ film during imprinting process. After 20 days room temperature aging, the imprinted HSQ shows no degradation. | | ISBN: | 0-9767985-2-2 |
| Pages: | 786 |
| Hardcopy: | $165.00 |
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