Nano Science and Technology Institute
Nanotech 2005 Vol. 3
Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3

Chapter 4:

Nano Scale Electronics Processing

-Resolution Enhancement in Nanoimprinting by Surface Energy Engineering
 G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong and R.S. Williams
 Hewlett Packard Laboratories, US
-Wafer Scale Aligned Sub-25nm Metal Nanowires on Silicon (110) using PEDAL Lift-off Process
 S.R. Sonkusale, C.J. Amsinck, D.P. Nackashi, N.H. Di Spigna, D. Barlage, M. Johnson and P.D. Franzon
 North Carolina State University, US
-Self-Assembled Cluster Nanostructures and Nanodevices
 S.A. Brown, J. Partridge, S. Scott, R. Reichel, A. Ayesh and K.C. Tee
 Nano Cluster Devices Ltd, NZ
-Aspect Ratio Improvement using the 2-step NERIME FIB Top Surface Imaging Process for Nano-lithography Applications
 K. Arshak, S.F. Gilmartin, D. Collins, O. Korostynska and A. Arshak
 University of Limerick and Analog Devices, IE
-Low Voltage Electron Beam Lithography in PMMA
 M. Bolorizadeh and D.C. Joy
 University of Tennessee, US
-Au Nano-Wire Transferring onto HSQ by Nano Imprinting Technology
 J.F. Liu, Y.J. Hsu, J.H. Chen, F.S. Huang and S.Z. Chen
 National Tsing Hua University, TW
-Sub-100nm and Large Area Pattern Process using by Hybrid Nanocontact Printing (HnCP)
 J. Jo, K-Y Kim, D-S Choi and E-S Lee
 Korea Institute of Machinery & Materials(KIMM), KR
-A Highly Reliable Pattern Transfer of Hydrogen Silsequioxane
 J.F. Liu, S.Z. Chen, H.J.H. Chen and F.S. Huang
 National Tsing Hua University, TW
-Nanoscale Reaction Analysis of Resist Materials for Nanolithography
 T. Kozawa, A. Saeki, K. Okamoto and S. Tagawa
 Osaka University, JP
-Nano Tungsten Silicide Thin Film Deposition and its Integration with Poly-Silicon
 M. Li and R. Suryanarayanan Iyer
 Applied Materials Inc., US
ISBN:0-9767985-2-2
Pages:786
Hardcopy:$109.95
 
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