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 | Nanotech 2005 Vol. 2
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Chapter 7: NEMS and MEMS Fabrication |
| | A Gate Layout Technique for Area Reduction in Nano-Wire Circuit Design | | Authors: | H. Hashempour and F. Lombardi | | Affilation: | LTX Corp., US | | Pages: | 471 - 474 | | Keywords: | nanowire, circuit design, layout optimization, physical area | | Abstract: | An strategy for developing integrated circuits with many individual nanodevices has yet to be formulated. This paper presents an homogeneous (array-based) approach for designing and manufacturing digital circuits using nanotubes or nanowires. By targeting contacts which occupy large area, and using a novel high level combinatorial formulation for area, substantial savings is obtained in physical mask layouts. The ultimate objective is to provide a further insight on the applicability of Moore's law to nanotechnology by evaluating the effects of area in logic circuit design. | | ISBN: | 0-9767985-1-4 |
| Pages: | 808 |
| Hardcopy: | $165.00 |
| Order: | Mail/Fax Form |
| Special: | 3 CD Set — 15% off with Free Shipping |
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