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 | Nanotech 2004 Vol. 2
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 2
Chapter 2: Nano Scale Device Modeling |
| | Impact of Quantum Mechanical Tunnelling on Off-leakage Current in Double-gate MOSFET using a Quantum Drift-diffusion Model | | Authors: | M-A Jaud, S. Barraud and G. Le Carval | | Affilation: | CEA-LETI, FR | | Pages: | 17 - 20 | | Keywords: | quantum tunnelling, double-gate, quantum-drift-diffusion-model | | Abstract: | With the growing use of wireless electronics systems, off-state leakage current in MOSFETs appears as one of the major physical limitations. Measurements of quantum tunnel current between source-drain (S?D) have recently shown that it will become detrimental in bulk MOSFET architecture for channel length around 5nm and at low temperature (£100K). After a careful validation of quantum drift-diffusion model (QDDM), we present a systematic study of the impact of source-drain direct tunnelling on off-state leakage current in double-gate MOSFET architectures. A large range of temperature (100K | | ISBN: | 0-9728422-8-4 |
| Pages: | 519 |
| Hardcopy: | $150.00 |
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