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 | Nanotech 2004 Vol. 1
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1
Chapter 10: Micro and Nano Structuring and Assembly |
| | A Novel Method for Determining Optimum Etch Times for the One Step Dry Release Proces | | Authors: | P.T. Docker, P.K. Kinnell and M.C. Ward | | Affilation: | The University of Birmingham, UK | | Pages: | 469 - 472 | | Keywords: | DRIE, Dry release process, STS etching, SOI wafers, Released structures | | Abstract: | This paper details a novel method for determining the optimum etch times for releasing structures when using the authors one step dry release process. By using self releasing structures known as waffles the exact point when a device is released can be determined without having to etch numerous chips for different times and sectioning them. This solution allows a worker to determine when a device is released by a simple visual check. | | ISBN: | 0-9728422-7-6 |
| Pages: | 521 |
| Hardcopy: | $150.00 |
| Special: | 3 CD Set — 15% off with Free Shipping |
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