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 | Nanotech 2003 Vol. 2
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 2
Chapter 3: Nano Scale Device Modeling |
| - | Process Modeling Based on Atomistic Understanding for State of the Art CMOS Device Design | | | S. Chakravarthi, M. Diebel, P.R. Chidambaram, S. Ekbote, S.T. Dunham, C.F. Machala and S. Johnson | | | Texas Instruments, US |
| - | Practical Atomistic Dopant Diffusion Simulation of Shallow Junction Fabrication Processes and Intrinsic Fluctuations for sub-100nm MOSFETs | | | M. Hane, T. Ezaki and T. Ikezawa | | | NEC Corporation, JP |
| - | Study of Alloy Disorder in Quantum Dots through Multi-million Atom Simulations | | | G. Klimeck, F. Oyafuso, T.B. Boykin, R.C. Bowen and P. von Allmen | | | NASA, Jet Propulsion Laboratory, US |
| - | Merging Atomistic and Continuum Simulations of Silicon Technology - The Best from the Two Worlds | | | P. Pichler | | | Fraunhofer Institute for Integrated Circuits, DE |
| ISBN: | 0-9728422-1-7 |
| Pages: | 600 |
| Special: | 3 CD Set — 15% off with Free Shipping |
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