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 | Nanotech 2003 Vol. 2
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 2
Chapter 1: Semiconductors |
| | High Speed Extraction of Process Model Parameters for 70nm Technology using a Distributed Genetic Algorithm | | Authors: | M. Murakawa, Y. Oda, H. Amakawa, S. Baba, T. Higuchi and K. Nishi | | Affilation: | AIST, JP | | Pages: | 60 - 63 | | Keywords: | model calibration, genetic algorithm, parallel computation, B implantation, dual-Pearson profile | | Abstract: | In this paper, we show, for the first time, GA application to process model calibration. We propose a distributed GA based calibration technique combined with the traditional local optimization algorithm, which reduces time for calibration considerably. Experimental results show calibration of 144 parameters can be completed with a few minutes, whereas it typically takes a human expert a few days. Our algorithm can be easily implemented on a coarse-grain parallel computer such as a PC cluster system or a multi processor workstation. GA, thus, can be a practical and robust tool for process/device calibration. |  | View paper | | ISBN: | 0-9728422-1-7 |
| Pages: | 600 |
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