| |
 | MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems
Chapter 4: Process Modeling |
| | Mask-Layout Synthesis Through an Evolutionary Algorithm | | Authors: | H. Li and E.K. Antonsson | | Affilation: | California Institute of Technology, U.S.A. | | Pages: | 113 - 116 | | Keywords: | MEMS, design, synthesis, genetic algorithm, bulk wet etching | | Abstract: | An automatic method for synthesizing MEMS mask-lay-outs is presented. This method uses evolutionary algorithm techniques to optimize the mask-layouts for a forward simu-lation of fabrication. Initially, a random population of mask-layouts is generated. The fabrication of each layout is sim-ulated through a digital process simulator to produce a 3D fabricated shape, which is compared to a user-specified desired shape. Each evolutionary loop governs the stochastic searching behavior such that the mask-layouts whose simu-lated shapes are closer to the desired shape are more likely to survive. More importantly, the ģbetterī masks are more likely to be evolved among those survived mask-layouts for the next loop. Through such evolutionary iterations, a near global ģoptimumī mask-layout is likely to be found. A test loop is constructed for the bulk wet etching mask synthesis by incorporating a 3D wet etching simulator. The current emerging results demonstrate the feasibility of this approach to mask-layout synthesis. |  | View paper | | ISBN: | 0-9666135-4-6 |
| Pages: | 697 |
| Hardcopy: | $100.00 |
| Special: | 3 CD Set 15% off with Free Shipping |
| Up | |
|
| nanoPRwire™ |
 |
| News Headlines |
 |
|
|
| |
| |
|
| | |
| |
|
|
