Process Modeling

	MSM 99 Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems Chapter 4: Process Modeling
-	A Program for Modeling of Technological Routes of VLSI Fabrication - ProMIC-T
	V. Tesluk and O. Korbetskyy
	Lvov Polytechnic, Ukraine
-	Simulation Support for Silicon-Bulk Microsystems Demonstrated in an Inclination Sensor Development
	D. Zielke
	GEMAC mbH, Germany
-	Laser Induced Surface Modification of Ceramic Substrates for Thermal and Electric Lines in Microsystems: Modeling Compared to Experiment
	H. Gruhn, R. Heidinger, M. Rohde, S. Rüdinger, J. Schneider and K.-H. Zum Gahr
	Forschungszentrum Karlsruhe, Germany
-	Nitrous Oxide-Based Progressive Silicon Oxynitridation in Furnaces of Different Dimensions
	S.S. Dang and C.G. Takoudis
	University of Illinois - Chicago, U.S.A.
-	Mask-Layout Synthesis Through an Evolutionary Algorithm
	H. Li and E.K. Antonsson
	California Institute of Technology, U.S.A.
-	Surface Reconstruction of Etched Contours
	C.-Y. Lee and E.K. Antonsson
	California Institute of Technology, U.S.A.
-	A Novel Method to Utilize Existing TCAD Tools to Build Accurate Geometry Required for MEMS Simulation
	N.M. Wilson, S. Liang, P.M. Pinsky and R.W. Dutton
	Stanford University, U.S.A.
-	Design of Compensation Structures for Anisotropic Etching
	M.K. Long, J.W. Burdick and E.K. Antonsson
	California Institute of Technology, U.S.A.
ISBN:	0-9666135-4-6
Pages:	697
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