Nano Science and Technology Institute
MSM 99
MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems

Chapter 4:

Process Modeling

-A Program for Modeling of Technological Routes of VLSI Fabrication - ProMIC-T
 V. Tesluk and O. Korbetskyy
 Lvov Polytechnic, UA
-Simulation Support for Silicon-Bulk Microsystems Demonstrated in an Inclination Sensor Development
 D. Zielke
 GEMAC mbH, DE
-Laser Induced Surface Modification of Ceramic Substrates for Thermal and Electric Lines in Microsystems: Modeling Compared to Experiment
 H. Gruhn, R. Heidinger, M. Rohde, S. RĂ¼dinger, J. Schneider and K.-H. Zum Gahr
 Forschungszentrum Karlsruhe, DE
-Nitrous Oxide-Based Progressive Silicon Oxynitridation in Furnaces of Different Dimensions
 S.S. Dang and C.G. Takoudis
 University of Illinois - Chicago, US
-Mask-Layout Synthesis Through an Evolutionary Algorithm
 H. Li and E.K. Antonsson
 California Institute of Technology, US
-Surface Reconstruction of Etched Contours
 C.-Y. Lee and E.K. Antonsson
 California Institute of Technology, US
-A Novel Method to Utilize Existing TCAD Tools to Build Accurate Geometry Required for MEMS Simulation
 N.M. Wilson, S. Liang, P.M. Pinsky and R.W. Dutton
 Stanford University, US
-Design of Compensation Structures for Anisotropic Etching
 M.K. Long, J.W. Burdick and E.K. Antonsson
 California Institute of Technology, US
ISBN:0-9666135-4-6
Pages:697
Up
© 2014 Nano Science and Technology Institute. All Rights Reserved.
Terms of Use | Privacy Policy | Contact Us | Site Map