Nano Science and Technology Institute - NSTI  
Nano Science and Technology Institute   Home | Subscribe | Site Map  
  ABOUT | COURSES | EVENTS | PUBLICATIONS | LEADERSHIP | OUTREACH | NEWS | PRESS | JOBS | Nanotechnology Solutions
px
px fade_top
Publications
Nanotech 2007 CDROM
Nanotech 2006 CDROM
Nanotech 2005 CDROM
Nanotech 2004 CDROM
3 CDROM Special Offer
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 2
Nanotech 2007 Vol. 3
Nanotech 2007 Vol. 4
Nanotech 2006 Vol. 1
Nanotech 2006 Vol. 2
Nanotech 2006 Vol. 3
Nanotech 2005 Vol. 1
Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 3
WCM 2005
Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 2
Nanotech 2004 Vol. 3
Nanotech 2003 Vol. 1
Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 3
Nanotech 2002 Vol. 1
Nanotech 2002 Vol. 2
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 2
MSM 2000
MSM 99
MSM 98
Index of Authors
Index of Keywords
Index of Affiliations
Library Request Form
Shopping Cart
Order Form
 
Publications Publications
MSM 98
p
 
Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems
MSM 98
Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems

Chapter 5:

Characterization, Parameter Extraction, Calibration

-Microelectromechanical Systems (MEMS) Design and Design Automation Research Projects at Duke University
 A. Dewey and R.B. Fair
 Duke University, U.S.A.
-Characterization of Electrostatically-Actuated Beams Through Capacitance-Voltage Measurements and Simulations
 E.K. Chan, K. Garikipati, Z.K. Hsiau and R.W. Dutton
 Stanford University, U.S.A.
-1/f Noise Characterization of a Surface-Micromachined Suspended Gate FET
 H. Fu, M.L. Kniffin, G. Watanabe, M.P. Masquelier and J. Whitfield
 Motorola, Inc., U.S.A.
-Fast Inductance Extraction of 3-D Structures with Non-Constant Permeabilities
 Y. Massoud and J.K. White
 Massachusetts Institute of Technology, U.S.A.
-Augmented Reality as an Interactive Tool for Microscopic Imaging, Measurement and Model Based Verification of Simulated Parts
 A. Sulzmann, C. Schütz, H. Hügli and J. Jacot
 EPFL, Switzerland
-Simple Method of Characterizing CMOS Channel Dopant Profiles Using CV Technique
 D. Kapila, M. Kulkarni, C. Fernando, J. Davis, K. Vasanth and G. Pollack
 Texas Instruments, Inc., U.S.A.
-Rational RSM Models for Device Characteristics as Functions of Process Parameters
 Y. Granik and V. Moroz
 PDF Solutions, Inc., U.S.A.
-Methodology for Calibrating Process and Device Simulators by Extracting Model Parameters from Electrical Data
 H-M Ho, Y. Zu, K.V. Loiko and D.H.Y. Lim
 Chartered Semiconductor Manufacturing Ltd., Singapore
-Validation and Calibration of Electrothermal Device Models Using Infrared Laser Probing Techniques
 R. Thalhammer, C. Fürböck, N. Seliger, E. Gornik and G. Wachutka
 Technical University of Münich, Germany
-Analysis and Characterization of Laterally Induced Electrostatic Repulsive Forces
 K.B. Lee and Y-H Cho
 Korea Advanced Institute of Science and Technology, Korea
-Inductance Extraction by Means of the Monte Carlo Method
 G. Leonhardt, C. Hager, P. Regli, W. Fichtner
 ETH-EPFL, Switzerland
ISBN:0-96661-35-0-3
Pages:678
Special:3 CD Set — 15% off with Free Shipping
Up
Upcoming Events
Nanotech 2008
Cleantech 2008
BioNano 2008
TechConnect Summit
nanoPRwire™
nanoPRwire
News Headlines
nano World news
 
 
 
 
px
© Nano Science and Technology Institute     About NSTI | Terms of Use | Privacy Policy | Contact