Nano Science and Technology Institute
MSM 98
MSM 98
Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems

Chapter 2:

Bulk and Topography Processing

-Molecular Dynamics (MD) Simulations of Reactive Ion Etching (RIE) of Silicon by Cl, Cl2, Br and Br2 Cations
 S.M. Valone, D.E. Hanson and J.D. Kress
 Los Alamos National Laboratory, US
-Computer Aided Mask-Layout for Bulk Etch Fabrication
 M.K Long, J.W. Burdick and E.K. Antonsson
 California Institute of Technology, US
-A Semi-Empirical Resist Dissolution Model for Sub-micron Lithographies
 M. Khan, S.B. Bollepalli and F. Cerrina
 UW-Madison, US
-A Method of MOSFET Dopant Profile Prediction and its Use in Transistor Design
 M. Kulkarni, K. Vasanath, J. Davis, S. Saxena and G. Pollack
 Texas Instruments, Inc., US
-Modeling Image Formation in Layered Structures: Application to X-ray Lithography
 S.B. Bollepalli, M. Khan and F. Cerrina
 UW-Madison, US
-Numerical Simulation for the Sacrificial Release of MEMS Square Diaphragms
 W.J. Li, J.C. Shih, J.D. Mai, C-M. Ho, J. Liu and Y-C. Tai
 UC-Los Angeles, US
-Three-Dimensional Simulation of Bulge Formation in Contact Hole Metalization
 W. Pyka and S. Selberherr
 Technical UniversityVienna, AT
ISBN:0-96661-35-0-3
Pages:678
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