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 | Nanotech 2002 Vol. 1
Technical Proceedings of the 2002 International Conference on Modeling and Simulation of Microsystems
Chapter 3: System Level Modeling of MEMS |
| | Simulation of Manufacturing Variations in a Z-axis CMOS-MEMS Gyroscope | | Authors: | S. Iyer and T. Mukherjee | | Affilation: | Carnegie Mellon University, USA | | Pages: | 186 - 189 | | Keywords: | manufacturing variations, CMOS-MEMS, gyroscope | | Abstract: | This paper uses MEMS circuit-level simulation to correlate gyro performance measures such as zero rate output (ZRO), linear acceleration sensitivity (Sa) and cross-axis sensitivity (Sca) to geometrical asymmetries. Elastic and electrostatic asymmetries in the gyroscope may arise due to device-level manufacturing variations in beam width, comb gap and metal mask misalignment in the CMOS-MEMS process. Analytical equations for the non-idealities are derived and compared with the simulation results. The analyses and simulations are used to develop pointers for robust design as well as manufacturing tolerances for limiting nonidealities. |  | View paper | | ISBN: | 0-9708275-7-1 |
| Pages: | 764 |
| Hardcopy: | $100.00 |
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