Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction
Authors:
N. Chaâbane, H. Vach and G.H. Peslherbe
Affilation:
CNRS-Ecole Polytechnique, France
Pages:
434 - 437
Keywords:
direct dynamics, trajectory study
Abstract:
Silicon chemical vapor deposition (CVD) is widely used in the microelectronic industry for the production of integrated circuits. For the underlying chemical reactions, the dynamical properties of the involved Si-H compounds are of fundamental interest. I
