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 | Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Chapter 9: Process Modeling |
| | A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator | | Authors: | C-Y. Lee and E.K. Antonsson | | Affilation: | California Institute of Technology, U.S.A. | | Pages: | 438 - 441 | | Keywords: | mask-layout synthesis, evolutionary algorithms, level sets | | Abstract: | Recently, evolutionary methods have been developed to automate MEMS mask-layout synthesis [3]([6]. These design synthesis methods are iterative searches in which each iteration consists of mask-layout modification, determination of etched shape via an arbitrary 3-D etch simulator, and similarity evaluations between the etched shape and the desired shape, which is used to guide modification. The work described here differs from previous work in that a framework is developed for mask-layout synthesis that implements level set methods as the 3-D etch simulator. |  | View paper | | ISBN: | 0-9708275-0-4 |
| Pages: | 638 |
| Hardcopy: | $100.00 |
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