 | Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Chapter 9: Process Modeling |
| - | Modeling of Deposition Process by Level Set Method |
| | H. Jung, O. Kwon, S. Yoon and T. Won |
| | Inha University, Korea |
| - | Layout Verification and Correction of CMOS-MEMS Layouts |
| | B. Baidya, K. He and T. Mukherjee |
| | Carnegie Mellon, U.S.A. |
| - | Diffusion Induced Stresses in Microstructures of MEMS |
| | F. Yang |
| | University of Rochester, U.S.A. |
| - | Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction |
| | N. Chaâbane, H. Vach and G.H. Peslherbe |
| | CNRS-Ecole Polytechnique, France |
| - | A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator |
| | C-Y. Lee and E.K. Antonsson |
| | California Institute of Technology, U.S.A. |
| - | Bonding Pad Resistance. A Combined Approach |
| | G. Bouche, R. Gonella and E. Sabouret |
| | Technology Modeling STMicroelectronics, France |
| - | Time Series Modelling of Surface Topography Generated by Ultrasonic Machining Process |
| | V.S.R. Murti, B. Naga Prasada Rao and M. Krishna Reddy |
| | Osmania University, India |
| - | Modeling of Deposition Process by Level Set Method |
| | H. Jung, O. Kwon, S. Yoon and T. Won |
| | Inha University, Korea |
| - | Layout Verification and Correction of CMOS-MEMS Layouts |
| | B. Baidya, K. He and T. Mukherjee |
| | Carnegie Mellon, U.S.A. |
| - | Diffusion Induced Stresses in Microstructures of MEMS |
| | F. Yang |
| | University of Rochester, U.S.A. |
| - | Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction |
| | N. Chaâbane, H. Vach and G.H. Peslherbe |
| | CNRS-Ecole Polytechnique, France |
| - | A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator |
| | C-Y. Lee and E.K. Antonsson |
| | California Institute of Technology, U.S.A. |
| - | Bonding Pad Resistance. A Combined Approach |
| | G. Bouche, R. Gonella and E. Sabouret |
| | Technology Modeling STMicroelectronics, France |
| - | Time Series Modelling of Surface Topography Generated by Ultrasonic Machining Process |
| | V.S.R. Murti, B. Naga Prasada Rao and M. Krishna Reddy |
| | Osmania University, India |
| ISBN: | 0-9708275-0-4 |
| Pages: | 638 |
| Hardcopy: | $100.00 |
| Special: | 3 CD Set — 15% off with Free Shipping |
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