Nano Science and Technology Institute - NSTI  
Nano Science and Technology Institute   Home | Subscribe | Site Map  
  ABOUT | COURSES | EVENTS | PUBLICATIONS | LEADERSHIP | OUTREACH | NEWS | PRESS | JOBS | Nanotechnology Solutions
px
px fade_top
Publications
Nanotech 2008 CDROM
Nanotech 2007 CDROM
Nanotech 2006 CDROM
Nanotech 2005 CDROM
Nanotech 2004 CDROM
3 CDROM Special Offer
Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 2
Nanotech 2008 Vol. 3
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 2
Nanotech 2007 Vol. 3
Nanotech 2007 Vol. 4
Nanotech 2006 Vol. 1
Nanotech 2006 Vol. 2
Nanotech 2006 Vol. 3
Nanotech 2005 Vol. 1
Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 3
WCM 2005
Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 2
Nanotech 2004 Vol. 3
Nanotech 2003 Vol. 1
Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 3
Nanotech 2002 Vol. 1
Nanotech 2002 Vol. 2
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 2
MSM 2000
MSM 99
MSM 98
Index of Authors
Index of Keywords
Index of Affiliations
Library Request Form
Shopping Cart
Order Form
 
Publications Publications
Nanotech 2001 Vol. 1
p
 
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
 
Chapter 5: Optimization
 

Statistical Optimal Design of Microelectromechanical Systems (MEMS)

Authors:H. Ren, A. Jog and R.B Fair
Affilation:Duke University, U.S.A.
Pages:169 - 172
Keywords:microelectromechanical system (MEMS), statistical MEMS design, yield optimization, MEMS reliability, robust design, Taguchi method
Abstract:A three-step technique for MEMS quality optimization is demonstrated. It exploits the relative merits of its constituent optimization components. Analog Devices' ADXL50 accelerometer was the test device with microstructure dimen-sions serving as design parameters. Manufacturing design rules [7] and sensor performance requirements served as design constraints. A static model relating input acceleration to sensed voltage was used, neglecting sensor and signal con-ditioning dynamics. The trimming yield of the ADXL50, with sensitivity as the design target, was improved by 37%. We show that the three-step method enables the search for an optimal design in a semi-automatic manner by facilitating user interaction. Our final goal is to enable the generation of MEMS mask layout while ensuring robust designs with minimum sensitivity to fabrication process variations.
Statistical Optimal Design of Microelectromechanical Systems (MEMS)View paper
ISBN:0-9708275-0-4
Pages:638
Hardcopy:$100.00
Special:3 CD Set — 15% off with Free Shipping
Up
nanoPRwire™
nanoPRwire
News Headlines
nano World news
 
 
 
 
px
© Nano Science and Technology Institute     About NSTI | Terms of Use | Privacy Policy | Contact