Nano Science and Technology Institute - NSTI  
Nano Science and Technology Institute   Home | Subscribe | Site Map  
  ABOUT | COURSES | EVENTS | PUBLICATIONS | LEADERSHIP | OUTREACH | NEWS | PRESS | JOBS | Nanotechnology Solutions
px
px fade_top
Publications
Nanotech 2008 CDROM
Nanotech 2007 CDROM
Nanotech 2006 CDROM
Nanotech 2005 CDROM
Nanotech 2004 CDROM
3 CDROM Special Offer
Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 2
Nanotech 2008 Vol. 3
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 2
Nanotech 2007 Vol. 3
Nanotech 2007 Vol. 4
Nanotech 2006 Vol. 1
Nanotech 2006 Vol. 2
Nanotech 2006 Vol. 3
Nanotech 2005 Vol. 1
Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 3
WCM 2005
Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 2
Nanotech 2004 Vol. 3
Nanotech 2003 Vol. 1
Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 3
Nanotech 2002 Vol. 1
Nanotech 2002 Vol. 2
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 2
MSM 2000
MSM 99
MSM 98
Index of Authors
Index of Keywords
Index of Affiliations
Library Request Form
Shopping Cart
Order Form
 
Publications Publications
Nanotech 2002 Vol. 2
p
 
Technical Proceedings of the 2002 International Conference on Computational Nanoscience and Nanotechnology
Nanotech 2002 Vol. 2
Technical Proceedings of the 2002 International Conference on Computational Nanoscience and Nanotechnology
 
Chapter 8: Extended-Scale Atomistics
 

Simulations of Dopant Clustering in Silicon: Dimer calculations using DFT forces

Authors:G. Henkelman, B. Uberuaga, S. Dunham and H. Jónsson
Affilation:University of Washington, USA
Pages:144 - 146
Keywords:dimer method, kinetic Monte Carlo, boron clustering, long time-scale
Abstract:We have carried out computer simulations to study the formation and break-up of boron clusters in crystalline silicon. Density functional theory was used to evaluate the interatomic interactions and dimer method used to nd the mechanism and rate of the atomic rearrangement processes. The transition rates were calculated within harmonic transition state theory. The simulations have shown how the highly stable cluster in silicon can break up, both by a direct dissociation mechanism and by an interstitial mediated dissociation. The former has an activation energy of 4.3 eV, but the latter around 3.5 eV. The formation of the boron clusters is diffusion limited, i.e. attachment of boron interstitials involves lower barrier than diffusion. But, rearrangements of the boron clusters from one configuration to another turn out to have rather large activation barriers.
Simulations of Dopant Clustering in Silicon: Dimer calculations using DFT forcesView paper
ISBN:0-9708275-6-3
Pages:504
Hardcopy:$100.00
Special:3 CD Set — 15% off with Free Shipping
Up
nanoPRwire™
nanoPRwire
News Headlines
nano World news
 
 
 
 
px
© Nano Science and Technology Institute     About NSTI | Terms of Use | Privacy Policy | Contact