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 | Nanotech 2001 Vol. 2
Technical Proceedings of the 2001 International Conference on Computational Nanoscience and Nanotechnology
Chapter 5: Atomic and Nanoscale Modeling |
| | Boron Diffusion and Activation in Silicon in the Presence of Other Species | | Authors: | H-J. Li, P. Kohli, S. Ganguly, T.A. Kirichenko, P. Zeitzoff, K. Torres and S. Banerjee | | Affilation: | Univ. of Texas Austin, U.S.A. | | Pages: | 108 - 111 | | Keywords: | Boron, diffusion, activation, shallow junction, ab initio calculation | | Abstract: | Modeling and experimental investigation of B equilibrium diffusivity and its activation in Si in the presence of other species, including ab initio calculations, are presented here. The results suggest that incorporating other species along with B into the Si substrate can achieve shallower junctions and higher B activation in semiconductor device applications. |  | View paper | | ISBN: | 0-9708275-3-9 |
| Pages: | 218 |
| Hardcopy: | $100.00 |
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