NSTI Nanotech 2009

The first Italian micro exposure tool for EUV lithography: design guidelines and experimental results

F. Flora, S. Bollanti, P. Di Lazzaro, L. Mezi, D. Murra, A. Torre
ENEA, IT

Keywords: EUV source, EUVL, laser-plasma, Schwarzschild optic, MET

Abstract:

The first Italian Micro Exposure Tool (MET) for EUV lithography has been developed at the ENEA Research Laboratories in Frascati (Italy). In spite of the very low cost of the Schwarzschild optics, the specific design of the low vibration board and the innovative alignment technique (a modified Foucault technique) applied to the Schwarzschild optics allowed the achievement of a resolution better than 100 nm on a wafer coated with a PMMA photoresist
 
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